Elementary processes in chemical vapor deposition: quantum chemical approach
نویسنده
چکیده
Chemical vapor deposition (CVD) is one of the key technologies for the epitaxial crystal growth of semiconductors. In order to obtain high-performance devices, atomically controlled thin films are required. Layer by layer growth consists of various processes, i.e ., the thermal decomposition of precursors, the adsorption of growing species, their surface migration, two-dimensional nucleation, the creation of new reconstruction, and so on. The microscopic mechanisms of these processes, however, have not yet been clarified.
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