Elementary processes in chemical vapor deposition: quantum chemical approach

نویسنده

  • Yoshiko S. Hiraoka
چکیده

Chemical vapor deposition (CVD) is one of the key technologies for the epitaxial crystal growth of semiconductors. In order to obtain high-performance devices, atomically controlled thin films are required. Layer by layer growth consists of various processes, i.e ., the thermal decomposition of precursors, the adsorption of growing species, their surface migration, two-dimensional nucleation, the creation of new reconstruction, and so on. The microscopic mechanisms of these processes, however, have not yet been clarified.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Muons in Chemistry: Remarkable H Atom Isotopic Mass Effects

The study of chemical reaction rates or “chemical kinetics” is fundamental to the study of chemistry itself and is intimately connected as well to life’s biochemical and biological processes. Most chemical reactions proceed by a complex mechanism that involves a series of elementary steps and it is often the role of chemical kinetics studies to identify these steps, with one typically expected ...

متن کامل

Modelling and Simulation of Materials Synthesis: Chemcial Vapor Deposition and Infiltration of Pyrolytic Carbon

Numerical simulation of materials synthesis based on detailed models for the chemical kinetics and transport processes is expected to support development and optimization of production processes. Exemplarily, chemical vapor deposition and infiltration of pyrolytic carbon for the production of carbon fiber reinforced carbon is studied by recently developed modeling approaches and computational t...

متن کامل

Modeling and simulation of materials synthesis: Chemical vapor deposition and infiltration of pyrolytic carbon

Chemical vapor deposition and infiltration of pyrolytic carbon for the production of carbon fiber reinforced carbon is studied by modeling approaches and computational tools developed recently. Firstly, the development of a gas-phase reaction mechanism of chemical vapor deposition (CVD) of carbon from unsaturated light hydrocarbons (C2H4, C2H2, and C3H6) is presented. The mechanism consisting o...

متن کامل

Chemical Vapor Deposition Synthesis of Novel Indium Oxide Nanostructures in Strongly Reducing Growth Ambient

The current study reports some interesting growth of novel In2O3 nanostructures using ambient-controlled chemical vapor deposition technique in the presence of a strongly reducing hydrazine ambient. The experiments are systematically carried out by keeping either of the carrier gas flow rate or the source temperature constant, and varying the other. For each of the depositions, the growth is st...

متن کامل

Hydrodynamic Studies of Fluidized Bed Chemical Vapor Deposition Reactors to Produce Carbon Nano Tubes via Catalytic Decomposition over Co/Pd MgO

The hydrodynamic studies of fluidized bed reactor has been reported in terms of pressure drop, minimum fluidization velocity and bed volume expansion to contribute to the optimization of the CNTs production parameters in fluidized bed reactors. Minimum fluidization velocity and pressure drop, as the most important parameters, were taken into account for the investigation of the hydrodynamic beh...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2000